Users Manual Coral name: Suss MA6 Model: Karl Suss MASK ALIGNER MA6/BA6 Location: Nanofab, Building 215 Contact: nanofab_litho@nist.gov Version: 1.0 . Page | 2 OVERVIEW: UV broadband (250nm-450nm), I-line (365nm) and G-line (436nm) wavelength available. Contact super-use for installing I-line or G-line filters.
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Karl Suss pa 200 user manual Karl Suss Pa 200 User Manual Equipment Classification - Georgia Tech | Cleanroom The Hitachi S-3700N Variable Pressure SEM features a low vacuum observation of 6 270 Pa. We have made sure that you find the PDF Ebooks without unnecessary research. And, having access to our ebooks, you can read Karl Suss Prober Manual ...
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Karl Suss MJB-3 Mask Aligner User’s Manual The MA6 has upgraded optics designed to output in the mid-UV Service manuals, schematics, eproms for electrical technicians. Ma6 Service Manual - www.doorway.ru The Karl Suss MA6 is a top and bottom side mask aligner used for fine lithography down to 1 micron or below.
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The Karl Suss MA6 is a top and bottom side contact lithography printer used for fine line lithography down to 1 micron or better. It is capable of processing 4-inch substrate. After reading this manual, the User should be able to describe a typical MA6 process for both top and backside alignment, explain the theory.
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The Karl Suss Mask Aligner performs high resolution photolithography. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard size wafers up to 6’’ in diameter. It uses 5” masks System and it can be operated manually.
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Karl Suss MJB-3 Mask Aligner User’s Manual The MA6 has upgraded optics designed to output in the mid-UV Service manuals, schematics, eproms for electrical technicians. Ma6 Service Manual - www.doorway.ru The Karl Suss MA6 is a top and bottom side mask aligner used for fine lithography down to 1 micron or below. 2.
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Karl Suss MA6 Mask Aligner Standard Operating Procedure Tool owner: Roman Akhmechet [email protected], x 8‐0468 Backup: David Barth [email protected]
The mask aligners supplied by SUSS MicroTec are based on proximity lithography. MO Exposure Optics® is a unique illumination optics specifically designed for SUSS mask aligners. It is based on micro-lens plates instead of macroscopic lens assemblies.
A) Load mask and substrate: If MA6 is not already in the "change mask" mode, press "change mask". Pull the mask holder out carefully if it is clamped in the aligner and put it on the left compartment. Choose the appropriate mask holder.
Pull the mask holder out carefully if it is clamped in the aligner and put it on the left compartment. Choose the appropriate mask holder. To change mask holder: a.