Karl Suss MA6/BA6 Mask Aligner Users Manual Coral name: Suss MA6 Model: Karl Suss MASK ALIGNER MA6/BA6 Location: Nanofab, Building 215 Contact: [email protected] Version: 1.0 . Page | 2 OVERVIEW: UV broadband (250nm-450nm), I-line (365nm) and G-line (436nm) wavelength ...
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R·I·T Title: Karl Suss MA150 Semiconductor & Microsystems Fabrication Laboratory Revision: F Rev Date: 05/08/2020 RIT SMFL Page 3 of 8 4.3.3 Custom holder for 5-inch glass which holds the mask from the back, allowing 5-inch plates to be used on 6-inch wafers.
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Karl Suss Ma6 Manual Suss Mask Aligner MA6/MA8 User Manual The SUSS MA6 Mask Aligner is designed for high resolution photolithography in a laboratory for devel- opment, small volume production or pilot production environment.
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ABOUT SUSS MICROTEC. With 70 years of engineering experience SUSS MicroTec is a leading supplier of process equipment for microstructuring in the semiconductor industry and related markets. Our portfolio covers a comprehensive range of products and solutions for backend lithography, wafer bonding and photomask processing, complemented by micro ...
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The Karl Suss MA 150M Manual Mask Aligner is a mask alignment and exposure system which offers unsurpassed precision and versatility when handling wafers up to 150 mm in diameter. In addition to this Karl Suss MA 150M, Capovani Brothers Inc. stocks a wide range of used mask aligners.
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Based on SUSS MicroTec's production proven mask aligner design the MA100/150e Gen2 enables exceptional process scalability and fast time-to-market for new device designs, while the industry leading throughput of 145 wafers per hour reduces cycle time. The MA100/150e …
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CT62 Karl Suss CT62 Programmable Process Controller from Karl Suss | Buy Today from Artisan. Fast Quotes & Shipping. Work with our experts to sustain your critical applications. Downloadable Technical Manuals and Datasheets. View It Live with InstraView
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The Karl Suss MA-6 Contact Aligner system can perform precision mask- to-wafer (sample) 1:1 contact printing in four modes; hard contact, soft contact, vacuum and proximity.
With 70 years of engineering experience SUSS MicroTec is a leading supplier of process equipment for microstructuring in the semiconductor industry and related markets. Our portfolio covers a comprehensive range of products and solutions for backend lithography, wafer bonding and photomask processing, complemented by micro-optical components.
Based on SUSS MicroTec's production proven mask aligner design the MA100/150e Gen2 enables exceptional process scalability and fast time-to-market for new device designs, while the industry leading throughput of 145 wafers per hour reduces cycle time. The MA100/150e Gen2 is optimized for wafers sizes up to 6".
The goal of the Investor Relations work at SUSS MicroTec is to achieve and maintain a fair valuation of our share in the capital market. Therefore, we are in close contact with our shareholders, and we pursue an open and continuous dialog with the capital market.
The MA6/BA6 is also configured to do bond aligning in support of the Suss Microtec SB6L Wafer Bonder. Whole wafers 2” up to 6” can be loaded. Samples pieces up to 6”x6” square can be loaded. Samples up to 6mm thick can be loaded..
The mask aligners supplied by SUSS MicroTec are based on proximity lithography. The lower the exposure gap from mask to wafer, the higher the resolution. In soft contact mode, the wafer is brought into contact with the mask and is fixed onto the chuck with vacuum.
The MA/BA Gen4 series can optionally be equipped with an energy-efficient LED light source, which not only reduces operating and maintenance costs, but improves work safety and environmental protection as well. This eliminates expensive hazardous waste disposal for mercury lamps.
They are typically used to define contacts and connections to the nanostructures that are defined using the KNI's other fabrication instruments (e.g. e-beam lithography). The MA6/BA6 is also configured to do bond aligning in support of the Suss Microtec SB6L Wafer Bonder.