Karl Suss MA6/BA6 Mask Aligner Users Manual Coral name: Suss MA6 Model: Karl Suss MASK ALIGNER MA6/BA6 Location: Nanofab, Building 215 Contact: nanofab_litho@nist.gov Version: 1.0 . Page | 2 OVERVIEW: UV broadband (250nm-450nm), I-line (365nm) and G-line (436nm) wavelength available. ...
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Karl Suss MJB3 UV400 Capabilities Description. The SUSS MJB3 UV400 is a mask aligner and exposure tool designed to handle substrates of various sizes up to 3 inches in diameter. The MJB3 is equipped with a 350 W mercury short-arc lamp with primary exposure wavelengths of 350 – 450 nm and enabling 0.6 micron resolution. ... MJB3 Quick Guide;
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The Karl Suss Mask Aligner is the newest addition to our photolithographic machines. It has touch screen controls that allow for parameters to be changed simply and efficiently. It is equipped with a Hitachi monitor for easy to view mask and wafer alignment.
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Equipped with reliable, precision alignment and high resolution printing capabilities into the submicron range, SÜSS aligners are renowned for their small footprint, ease of use, quality of results and long term reliability. Featuring patented exposure optics with LED or mercury lamp houses, optimal results are achieved in either proximity or contact lithography modes for wafer …
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SNF is open under New Normal Rules.ANY shadowing must be coordinated with SNF staff first.
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Karl Suss Mask Aligner Operating Instructions. This machine is to be used by authorized personnel only. For training contact the MFC Engineer in office 201E, phone: (520) 621-9849.
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for all Karl Suss models models using the 1000 watt lamp house: 31: ellipsoidal mirror used in 350 watt lamp house for all Karl Suss models using the 350 watt lamp house. 32: air cylinder for mirror house exposure movement forward and backward. for use on Karl Suss model ma6 or ma8. 33: quick disconnect female vacuum or pressure fitting.
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ClassOne Equipment, Inc. 5302 Snapfinger Woods Drive, Decatur, Georgia 30035, United States Tel: +1 770 808 8708, Fax: +1 770 808 8308, Email: [email protected]
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The Karl Suss MJB-3 Mask Aligner is designed for high resolution photolithography. The MJB-3 offers flexibility in the handling of irregular shaped substrates and pieces of differing thickness, as well as mask sizes of 3x3 inches. Geometries as small as 1.5 microns can be achieved using the 365 Nanometer wavelength illumination.
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The Karl Suss Mask Aligner performs high resolution photolithography. It offers unsurpassed flexibility in the handling of irregularly shaped substrates of differing thickness, as well as standard size wafers up to 6’’ in diameter. It uses 5” masks System and it can be operated manually.
Karl Suss MA6 Mask Aligner Standard Operating Procedure Tool owner: Roman Akhmechet [email protected], x 8‐0468 Backup: David Barth [email protected]
A) Load mask and substrate: If MA6 is not already in the "change mask" mode, press "change mask". Pull the mask holder out carefully if it is clamped in the aligner and put it on the left compartment. Choose the appropriate mask holder.
Pull the mask holder out carefully if it is clamped in the aligner and put it on the left compartment. Choose the appropriate mask holder. To change mask holder: a.